Real Virtual Patterning
PROLITH™ X5 is a lithography and patterning simulation solution that uses advanced models to quickly and accurately simulate how designs will print on the wafer. This computational lithography tool is used by IC, LED and MEMS manufacturers, scanner companies, track companies, mask manufacturers, material providers and research consortia to cost-effectively evaluate patterning technologies. This includes EUV, double patterning (litho-etch-litho-etch (LELE) and Self-Aligned Strategies), as well as the other standard technologies. As a critically important modeling tool for all patterning processes, PROLITH X5 helps lithographers expand their areas of research while significantly reducing the time required to identify workable solutions.
Advanced Lithography Technologies: When developing lithography processes for 2Xnm and below design nodes, researchers need to evaluate EUV lithography, double patterning lithography and creative single patterning lithography technologies. They must understand how pattern printing is affected by lithography variables, such as mask sets, scanner parameters and resist materials. The traditional method of evaluating these lithography technologies – printing hundreds of test wafers using experimental materials and prototype process equipment – would be complex, expensive, and time consuming. PROLITH acts as a lithography simulation tool, providing researchers with affordable means for modeling different lithography technologies and reducing the development time for their most advanced devices.
The Users Only site houses the PROLITH technical papers collection, a knowledge base that comprises over one hundred technical papers representing more than 25 years of advanced lithography research and development. The site is also used for product downloads.